Patterned Self-Assembled Monolayers Formed by Microcontact Printing Direct Selective Metalization by Chemical Vapor Deposition on Planar and Nonplanar Substrates
نویسندگان
چکیده
Self-assembled monolayers (SAMs) of alkylsiloxanes were patterned by microcontact printing @CP) on a number of substrates: A1/A1&, SUSi02, TiN/Ti02, glasses, indium tin oxide (ITO), and plasma-modified polyimide. The patterned SAMs on these surfaces define and direct the selective chemical vapor deposition (CVD) of copper using (hexafluoroacetylacetonato)(vinyltrimethylsilane)copper(I) (CuI(hfac)(vtms)) as the source gas. This paper presents several examples of microstructures of copper fabricated by selective, SAM-directed CVD, including fabrication of thin-film interconnects (with feature sizes of 0.5100 pm), and selective filling of trenches and vias (models of microstructures having high aspect ratios) with feature sizes below 1 pm.
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